Filtration

Entegris provides filtration solutions based on a variety of media technologies and performance criteria as well as analytical services to detect contamination in technology environments and analyze/validate materials.

Gas Filtration

Nickel, stainless steel and Teflon® filter technologies. Entegris ultrapure gas filtration products offer 0.003 microns particle filtration for ultrapure gas applications. Wafergard® gas filters enable higher process gas throughput while reducing the overall gas box footprint. Entegris' ultrapure gas filtration products are used by all major semiconductor OEMs and device makers in etch, CVD, PVD and ion implantation tools as well as other high-performance applications such as photovoltaics, flat panel display, data storage and HBLED (high brigtness light emitting diodes), life sciences and lithium ion battery. Entegris incorporates its gas filters into our gas purifiers to provide process and purge gases free from both molecular and particle contamination.

Liquid Filtration

Contamination control of process liquids. Contamination control continues to evolve and enable the technological advancements and yield improvements in semiconductor, flat panel, data storage, photovoltaic cell, life sciences and lithium ion battery manufacturing. CMP slurries, acids, bases, photochemistry and DI water all require advanced filtration to remove defect-causing particles and agglomerate before reaching the wafer or substrate surface. Entegris provides a full line of filters to solve the contamination control challenges our customers face.